| 摘要 |
PURPOSE:To deposite selectively reacted products easily and precisely, by forming a film for propagating efficiently exciting light or nucleus producing light and a reflecting film on the surface of a substrate, by photo-etching them, and by concentrating the exciting light or nucleus producing light at a required region. CONSTITUTION:After a film 2 for propagating light efficiently and a film 3 for reflecting light efficiently are overlaid on the surface of a substrate 1, a window is opened at a required region 4. After the substrate having windows 5 for incident light formed through the film 3 is housed in a photo CVD appara tus, reactive gas exciting light 6 incident slantingly through the windows 5 is introduced into the film 2, and is reflected repeatedly by the film 3 and sub strate 1 to reach the required region 4. The introduced reactive gas is excited at only the region 4 and window 5 to be deposited there. Etching the films 2, 3 leaves the deposited film 7 only at the required region 4. The same is true of nucleus producing light 6'. In this way, since a photo CVD can be attained even if light is incident to any portion of the incident light windows, the alignment accuracy of the incident light is almost negligible. |
