Adaptive wafer modulator for placing a selected pattern on a semiconductor wafer

摘要

An adaptive wafer modulator in a photolithography device is described. A focal pattern of a lithographic system is calibrated. Prior to exposing a wafer surface to a selected image pattern, the wafer surface is elastically bent or modulated by actuating a set of adjustable pins supporting the wafer so that the wafer surface being exposed conforms more closely to the calibrated focal pattern of the lithographic system than to the presumed flat focal plane of the lithographic system.