发明名称 |
Lithographic apparatus and device manufacturing method |
摘要 |
A lithographic apparatus including an illumination system for providing a beam of radiation and a support structure for supporting a patterning device. The patterning device serving to impart the beam with a pattern in its cross-section. The apparatus also having a substrate table for holding a substrate and a projection system for projecting the patterned beam onto a target portion of the substrate. The lithographic apparatus further having a chuck for supporting an object and a frame which supports the chuck with respect to other parts of the lithographic apparatus. The chuck is thermally isolated from at least the frame.
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申请公布号 |
US7106416(B2) |
申请公布日期 |
2006.09.12 |
申请号 |
US20030731428 |
申请日期 |
2003.12.10 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
BOX WILHELMUS JOSEPHUS;GILISSEN NOUD JAN;OTTENS JOOST JEROEN |
分类号 |
G03B27/42;H01L21/683;G03B27/58;G03F7/20;H01L21/027 |
主分类号 |
G03B27/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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