发明名称 |
Siloxane-based resin and interlayer insulating film formed using the same |
摘要 |
A siloxane-based resin having a novel structure and a semiconductor interlayer insulating film using the same. The siloxane-based resins have a low dielectric constant in addition to excellent mechanical properties and are useful materials in an insulating film between interconnecting layers of a semiconductor device.
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申请公布号 |
US7108922(B2) |
申请公布日期 |
2006.09.19 |
申请号 |
US20040768058 |
申请日期 |
2004.02.02 |
申请人 |
SAMSUNG ELECTRONIC CO., LTD. |
发明人 |
LYU YI YEOL;YIM JIN HEONG;SONG KI YONG;JEONG HYUN DAM;RYU JOON SUNG |
分类号 |
C08G77/50;C09D5/00;C08G77/14;C08L83/04;C09D183/14;H01L21/312;H01L21/316 |
主分类号 |
C08G77/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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