发明名称 Substrate conveyor apparatus, substrate conveyance method and exposure apparatus
摘要 With respect to a substrate conveyor apparatus that, being a substrate conveyor apparatus that carries substrate on which patterns are formed, carries the substrate in a state protected by a protective cover when the substrate is not used, a substrate conveyor apparatus having a cover protection means that covers the inner surface of the protective cover when the substrate is used.
申请公布号 US7483123(B2) 申请公布日期 2009.01.27
申请号 US20050235130 申请日期 2005.09.27
申请人 NIKON CORPORATION 发明人 HIRAYANAGI NORIYUKI
分类号 G03B27/58;G03F1/66;G03F7/20;H01L21/027;H01L21/673;H01L21/677 主分类号 G03B27/58
代理机构 代理人
主权项
地址