| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pattern forming method which can increase a productivity by increasing a pattern accuracy during formation of a pattern, and also an exposure apparatus using the method. <P>SOLUTION: A member 5 (liquid repellent film 6) as a processing target and a photomask 7 are spaced to define a space between the liquid repellent film 6 formed on the processing target member 5 and the photomask 7. A nitrogen gas 18 is introduced from a gas generator 16 via an inlet pipe 15 into the space between the liquid repellent film 6 formed on the processing target member 5 and the photomask 7. Ultraviolet light 13 is applied to a wiring pattern formation of the processing target member 5 via light transmitters 10 of the photomask 7, so that the liquid repellent film 6 corresponding to the wiring pattern formation breaks down and a volatile component is generated. The generated volatile component is emitted into the space between the liquid repellent film 6 formed on the processing target member 5 and the photomask 7, and then externally discharged together with the nitrogen gas 18 from the space through an exhaustion pipe 19. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
