COBALT, IRON, BORON, AND/OR NICKEL ALLOY-CONTAINING ARTICLES AND METHODS FOR MAKING SAME

摘要

Methods for making a high purity (>99.99%) and low oxygen (<40 ppm) sputtering target containing Co, CoFe, CoNi, CoMn, CoFeX (X═B, C, Al), Fe, FeNi, or Ni alloys with a column microstructure framed by boron intermetallics are disclosed. The sputtering target is made by directional casting a molten mixture of the metal alloy, annealing to remove residual stresses, slicing, and optional annealing and finishing to obtain the sputtering target.

主权项

1. A method for making a sputtering target, comprising:
forming a molten alloy mixture, wherein the molten alloy mixture comprises (i) a composition including at least one of Co, Fe, or B, as a primary constituent, or (ii) a composition including Co and at least one of Fe, and Ni, or (iii) a composition of the formula CoFeX, wherein X is one of B, C, or Al; pouring the molten mixture into a mold to form a directional casting ingot; annealing the casting ingot; and slicing the casting ingot to form the sputtering target. wherein the sputtering target has a purity of greater than 99.99% and a low oxygen content of 40 ppm or less, and has a column microstructure framed by borides.