发明名称 |
Polyimides, process for producing the same and photosensitive composition containing the same |
摘要 |
<p>Polyimide is produced by reacting two kinds of diamine compounds consisting of diaminopolysiloxane and a carboxyl group-containing diamine or three kinds of diamine compounds consisting of diaminopolysiloxane, a carboxyl group-containing diamine and an aromatic or alicyclic diamine with a dicarboxylic acid anhydride having a 2,5-dioxotetrahydrofuryl group as one acid anhydride group, thereby once forming a polyamic acid, and subjecting the polyamic acid to polyimidization reaction. The resulting polyimide itself is soluble in low boiling organic solvents for general purpose use, typically methyl ethyl ketone. A photosensitive composition comprising the polyimide, a photo crosslinking agent and a photo acid-generating agent forms a negative type polyimide pattern upon development with an aqueous alkali solution.</p> |
申请公布号 |
EP0957125(A1) |
申请公布日期 |
1999.11.17 |
申请号 |
EP19990104024 |
申请日期 |
1999.03.15 |
申请人 |
NIPPON MEKTRON, LIMITED |
发明人 |
CHIANG, LIN-CHIU;LIN, JENQ-TAIN;SENSUI, NOBUYUKI |
分类号 |
G03F7/038;C08G73/10;C08G77/455;(IPC1-7):C08G73/10 |
主分类号 |
G03F7/038 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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