System and method for predicting software models using material-centric process instrumentation

摘要

A system and method for predicting software models used in chemical mechanical polishing (CMP) of workpieces using material-centric process instrumentation. One embodiment is a system which includes a feed forward loop for computing predictive calculations, a feed back loop for computing run-to-run calculations, a historical database which links together the feed forward and feed back loops, and a computational engine used to calculate new or adjusted CMP process parameters.