发明名称 PHOTOSENSITIVE RESIN COMPOSITION AND MOLD USING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive resin composition for preparation of molds, enabling thick film curing in the air and excellent in mechanical properties, molds and a method for producing molds. SOLUTION: This photosensitive resin composition is characterized by including (1) a compound having two or more ring-opening polymerization reactive groups in the molecule, (2) an ethylenically unsaturated compound simultaneously having hydroxy group and ethylenically unsaturated bond in the molecule and having >=200 molecular weight, (3) an ethylenically unsaturated compound not having hydroxy group and having two or more ethylenically unsaturated bonds in the molecule and (4) a compound generating an acid by absorbing active beam.
申请公布号 JP2002327127(A) 申请公布日期 2002.11.15
申请号 JP20020049494 申请日期 2002.02.26
申请人 ASAHI KASEI CORP 发明人 TSUCHIYA SUKEYUKI;YAMADA HIROSHI
分类号 B29C33/40;C08G59/62;C08K3/00;C08K5/00;C08L101/02;(IPC1-7):C08L101/02 主分类号 B29C33/40
代理机构 代理人
主权项
地址