SPUTTERING CRYSTALLIZING APPRATUS USING LASER AND SPUTTERING CRYSTALLIZING METHOD USING THEREOF

摘要

The present invention relates to a sputtering and crystallizing apparatus using a laser. The sputtering and crystallizing apparatus using a laser comprises: a drum allowing a flexible substrate to be wound around an outer circumferential surface thereof and installed to rotate; a first reflective plate disposed to face the outer circumferential surface of the drum, and making a laser reflected from the drum to be incident on the drum again; a first laser irradiating unit making the laser to be incident between the first reflective plate and the drum; a second reflective plate disposed to face the outer circumferential surface of the drum, and making the laser to be incident on the drum again; a second laser irradiating unit making the laser to be incident between the second reflective plate and the drum; and a sputtering member disposed between the first reflective plate and the second reflective plate, and sputtering a sputtering material on the flexible substrate.