发明名称 Semiconductor laser with improved current conduction
摘要 A semiconductor laser includes a layer structure with superimposed layers with at least the following layer structure: an n-doped outer layer, a third wave-guiding layer, an active zone in which light-generating structures are arranged, a second wave-guiding layer, a blocking layer, a first wave-guiding layer, a p-doped outer layer. The first, second and third wave-guiding layers have at least AlxInyGa (1−x−y) N. The blocking layer has an Al content which is at least 2% greater than the Al content of the adjacent first wave-guiding layer. The Al content of the blocking layer increases from the first wave-guiding layer towards the second wave-guiding layer. The layer structure has a double-sided gradation. The double-side gradation is arranged at the height of the blocking layer such that at least one part of the blocking layer or the entire blocking layer is of greater width than the first wave-guiding layer.
申请公布号 US9373937(B2) 申请公布日期 2016.06.21
申请号 US201314430685 申请日期 2013.09.03
申请人 OSRAM Opto Semiconductors GmbH 发明人 Strauβ Uwe;Wurm Teresa;Avramescu Adrian Stefan;Brüderl Georg;Eichler Christoph;Gerhard Sven
分类号 H01S5/20;H01S5/22;H01S5/323;H01S5/30;H01S5/343;H01S5/32;H01S5/40 主分类号 H01S5/20
代理机构 Slater Matsil, LLP 代理人 Slater Matsil, LLP
主权项 1. A semiconductor laser comprising a layer structure comprising layers arranged one on top of another with at least the following layer sequence, the semiconductor laser comprising: an n-doped cladding layer; a third waveguide layer overlying the n-doped cladding layer; an active zone overlying the third waveguide layer, wherein light generating structures are arranged in the active zone; a second waveguide layer overlying the active zone; a blocking layer overlying the second waveguide layer; a first waveguide layer overlying the blocking layer; and a p-doped cladding layer overlying the first waveguide layer; wherein the first, second and third waveguide layers comprise at least AlxInyGa(1−x−y)N, where 0<x <1, where 0<y<1, and where 0<x+y<1; wherein the blocking layer has an Al concentration that is at least 2% greater than the Al concentration of the first waveguide layer; wherein the blocking layer has an increase in Al concentration from the first waveguide layer in a direction toward the second waveguide layer; and wherein the blocking layer has a double-side stepped graduation, such that at least part of the blocking layer has a greater width than the first waveguide layer.
地址 Regensburg DE