| 摘要 |
PROBLEM TO BE SOLVED: To provide an electron beam irradiation apparatus, having a function for apparatus calibration, improving a plotting efficiency.SOLUTION: An electron beam irradiation apparatus 11, for performing batch plotting by irradiating an object to be irradiated with an electron beam includes: a first aperture 13, having a first aperture area 13a and a first plotting area 13b; and a second aperture 15, having a second aperture area 15a and a second plotting area 15b. An electron beam 40, passing through the first aperture area 13a, reaches the second plotting area 15b and passes through the first plotting area 13b. The electron beam 40 reaches the second aperture area 15a. At a time of apparatus calibration, the calibration electron beam 40 is generated by the first aperture area 13a and the second aperture area 15a.SELECTED DRAWING: Figure 1 |
