发明名称 SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device having high resistance against ESD (Electrostatic Discharge).SOLUTION: A semiconductor device according to an embodiment comprises: a first conductivity type first semiconductor region; a second conductivity type second semiconductor region adjacent to the first semiconductor region; a first conductivity type third semiconductor region which is adjacent to the second semiconductor region and spaced from the first semiconductor region; a first insulation film provided on the second semiconductor region and between the first semiconductor region and the third semiconductor region; a first electrode provided on the first insulation film; a high-pass filter connected between the first semiconductor region and the third semiconductor region; and a low-pass filter connected between the second semiconductor region and the third semiconductor region.SELECTED DRAWING: Figure 1
申请公布号 JP2016162910(A) 申请公布日期 2016.09.05
申请号 JP20150041089 申请日期 2015.03.03
申请人 TOSHIBA CORP 发明人 IKIMURA TAKEHITO
分类号 H01L21/822;H01L21/336;H01L21/8234;H01L27/04;H01L27/06;H01L27/088;H01L29/78 主分类号 H01L21/822
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