发明名称 |
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THEREFOR |
摘要 |
Disclosed are a semiconductor device and a method for manufacturing the same. According to an embodiment, the semiconductor comprises: a substrate; a plurality of thin films formed on the substrate and having a circuit pattern formed thereon; and an insulating layer for insulating the plurality of thin film layers from each other. The plurality of thin film layers are connected through a via pad including a via. The upper part and the lower part of the via pad individually have a protruding pattern, and at least two among the plurality of thin film layers are connected through a stacked via structure. |
申请公布号 |
KR20160110588(A) |
申请公布日期 |
2016.09.22 |
申请号 |
KR20150032418 |
申请日期 |
2015.03.09 |
申请人 |
SAMSUNG ELECTRO-MECHANICS CO., LTD. |
发明人 |
CHUNG, DOO YUN;CHOI, YONG SEOK;LEE, DAE HYEONG;JOO, SEUL KI;MA, WON CHUL |
分类号 |
H01L21/768;H01L21/31;H01L21/48;H01L21/66 |
主分类号 |
H01L21/768 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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