发明名称 ALIGNMENT METHOD AND SYSTEM FOR MANUFACTURING MASK INTEGRATION FRAMEWORK
摘要 An alignment method for manufacturing a mask integration framework, comprising: establishing an absolute coordinate system by taking the center of a metal framework as an origin of coordinates, the center of the metal framework coinciding with that of an array substrate serving as a reference; controlling the array substrate to move, such that an offset of coordinates of a pixel point under the absolute coordinate system with respect to a pre-set theoretical value is smaller than or equal to a pre-determined error value; and transmitting the coordinates of the pixel point under the absolute coordinate system, after the array substrate moves, to a tightening apparatus. An alignment system for manufacturing a mask integration framework.
申请公布号 WO2016188212(A1) 申请公布日期 2016.12.01
申请号 WO2016CN77241 申请日期 2016.03.24
申请人 BOE TECHNOLOGY GROUP CO., LTD.;ORDOS YUANSHENG OPTOELECTRONICS CO., LTD. 发明人 ZHANG, Xinjian
分类号 C23C14/04;C23C14/24 主分类号 C23C14/04
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