发明名称 Method for thinning a semiconductor wafer
摘要 Advances in wafer technology and packaging have led to an increase in wafer size while requiring a decrease in wafer thickness. Thickness limitations increase as wafer diameter increases. Thinning a wafer past a certain limit can result in wafer breakage. A laminated semiconductor wafer structure (10) is assembled to provide mechanical support for the wafer. A semiconductor wafer (12) is affixed to a UV transparent support substrate (16) with a double-sided adhesive tape (14). The tape has dissimilar adhesives on its two sides. The first side has a UV curable adhesive (22) that adheres to the active surface of the wafer. The second side has a non-UV curable adhesive (24) which adheres to the UV transparent support substrate. This laminated structure can be used during a wafer thinning process and any subsequent handling. The support substrate and the tape are removed from the wafer by exposing the laminated structure to UV radiation.
申请公布号 US5476566(A) 申请公布日期 1995.12.19
申请号 US19940187363 申请日期 1994.01.26
申请人 MOTOROLA, INC. 发明人 CAVASIN, DANIEL
分类号 H01L21/68;(IPC1-7):B32B31/04;B32B31/22;B32B31/28 主分类号 H01L21/68
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