发明名称 RESIST DEVELOPMENT APPARATUS
摘要 PROBLEM TO BE SOLVED: To efficiently remove a solvent component of a developing liquid or rinse liquid in a paste membrane by heating with a heating furnace having a panel-shaped red-infrared radiation part after removing the developing liquid or rinse liquid. SOLUTION: At a developing part 110, a processing substrate 180 is placed on a roll (rotating roll) 150 with a resist facing upward, and a developing liquid is sprayed onto the resist face by stray for developing. At a rinse part 120, a processing substrate 180 is placed on the roll 150 with the resist facing upward, and a rinse liquid is sprayed onto the resist face by spray for rinsing. At an air knife part 130, the processing substrate 180 is placed on the roll 150, and a high-pressure air 135 is blown to an air nozzle 133 for liquid cutting process. At a drying furnace 140, the processing substrate 180 is placed on the roll 150, red-infrared rays are irradiated with the processing substrate 180 over the resist face by means of a panel heater 143, and the resist part and a bulkhead forming paste membrane are dried.
申请公布号 JPH11204025(A) 申请公布日期 1999.07.30
申请号 JP19980017694 申请日期 1998.01.14
申请人 DAINIPPON PRINTING CO LTD 发明人 MATSUMOTO TAKESHI;NIWA NOBUYUKI
分类号 G03F7/004;G03F7/30;H01J9/02;H01J17/49;H01L21/027 主分类号 G03F7/004
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