METHOD FOR FORMING PATTERN ONTO PHOTORESIST, HOLOGRAM THEREFOR, HOLOGRAM RECORDING SYSTEM AND APPLICATION TO MICROCHIP SCREEN OR ELECTRONIC SOURCE

摘要

PROBLEM TO BE SOLVED: To provide a simplified method for forming a pattern onto photoresist. SOLUTION: This concerns a method for forming holes in photoresist 22, wherein a hologram image 138 of a single micro-spherical layer is formed by irradiating the single micro-spherical layer with vertical light beams while having parallel beams. Thus, a three-dimensional(3D) hologram recording image of the single layer and of a beam flux converged near the micro-spherical image is acquired and a 3D hologram image 144 of the beam flux is located within the thickness of the photoresist 22. Thus, an area of the photoresist 22 is exposed and developed, thus a pattern is formed in the above exposed area.