| 摘要 |
<P>PROBLEM TO BE SOLVED: To prevent a contact between composition apparatus even when a plurality of composition apparatus are supported by use of a gas spring. <P>SOLUTION: An image of a pattern is exposed to a substrate W on a projection optical system PL by use of a moving stage 40. This exposure apparatus comprises a first support device 300 for supporting the projection optical system PL by a pressure of a gas fed into a first gas chamber 300a; a second support device 58 for supporting the moving stage 40 by a pressure of a gas fed into a second gas chamber 180; and exhaust devices 70, 80 which prevent the interference between the projection optical system PL and the moving stage 40, by differing an air volume displacement of the first gas chamber 300a from an air volume displacement of the second gas chamber 180. <P>COPYRIGHT: (C)2007,JPO&INPIT |
