| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide exposure equipment preventing thermal deformation of a reticle, and an exposure method using the equipment. <P>SOLUTION: The exposure equipment includes a reticle library 110 having a plurality of slots, a reticle stage 130 on which an exposure process proceeds, wherein a reticle is transferred to a reticle storage member 110 having a plurality of slots, then the reticle is transferred from one of the plurality of slots to the reticle stage 130 while the one of the plurality of slots is controlled at a saturation temperature of the reticle. <P>COPYRIGHT: (C)2007,JPO&INPIT |
