VACUUM TREATING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a vacuum treating apparatus which blows off the dust adhered to the surface of a substrate to be treated by vent gas when venting a load locking chamber and is capable of preventing the soaring up of the dust in the load locking chamber. SOLUTION: This apparatus has a process chamber which houses the substrate W to be treated therein and treats the substrate under a vacuum, the load locking chamber 1 which is capable of switching a vacuum state and an atmospheric state independently from the process chamber, and temporarily houses the substrate W to be treated when carrying the substrate W to be treated into and out of the process chamber, a venting means 2 which introduces the vent gas G into the load locking chamber 1 in the vacuum state and switches the vacuum state to the atmosphere state and a planar vent filter 4 which faces the surface of the substrate W to be treated housed in the load locking chamber 1 and is arranged apart therefrom. The vent filter 4 approximately covers the entire surface of the substrate W to be treated. The vent gas G introduced from the vent means 1 into the load locking chamber 1 is filtered by the vent filter 4 and is then blown to approximately the entire part of the surface of the substrate W to be treated.