发明名称 |
Use of a chemically active reticle carrier for photomask etching |
摘要 |
A method and apparatus for improving etch uniformity in reticle etching by eliminating local effects at the edge of the reticle is disclosed. The present invention relates to a reticle frame which surrounds the reticle. The reticle frames are patterned with a pattern profile similar to that of the reticle to prevent edge uniformities of the reticle by allowing uniform plasma etching of the entire reticle surface. The reticle frames may also be used to move the reticle in and out of etch chambers without damaging them.
|
申请公布号 |
US2001037859(A1) |
申请公布日期 |
2001.11.08 |
申请号 |
US20010903559 |
申请日期 |
2001.07.13 |
申请人 |
STOCKS RICHARD;DONOHOE KEVIN |
发明人 |
STOCKS RICHARD;DONOHOE KEVIN |
分类号 |
G03F1/14;G03F7/42;(IPC1-7):C23F1/00;H01L21/306 |
主分类号 |
G03F1/14 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|