发明名称 |
SAMPLE INSPECTION DEVICE AND SAMPLE INSPECTION METHOD |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a reticle inspection device capable of two-dimensional correction. <P>SOLUTION: This device is characterized by being equipped with an X-axis laser interferometer 201 and an X-axis laser scale 202 for measuring an X-coordinate position on a reticle 101; a Y-axis laser interferometer 211 and a Y-axis laser scale 212 for measuring a Y-coordinate position on the reticle 101; a laser optical device 103 and a transmitted light detection part 105 or the like used as an optical image acquisition part for acquiring an optical image on the reticle 101; an optical image correction part 140 for correcting the position of the optical image acquired by the optical image acquisition part based on XY-coordinates in a design of a plurality of prescribed positions on the reticle 101 and XY-coordinates of the plurality of prescribed positions measured by the X-axis laser interferometer 201 and the X-axis laser scale 202, and the Y-axis laser interferometer 211 and the Y-axis laser scale 212; and an image comparison part 108 for comparing the optical image with a prescribed reference image on the corrected position. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
申请公布号 |
JP2006266864(A) |
申请公布日期 |
2006.10.05 |
申请号 |
JP20050085253 |
申请日期 |
2005.03.24 |
申请人 |
ADVANCED MASK INSPECTION TECHNOLOGY KK |
发明人 |
TATENO MOTONARI;KIMURA MASAYOSHI |
分类号 |
G01B11/24;G03F1/84;H01L21/027 |
主分类号 |
G01B11/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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