| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a halftone film type gray tone mask having an excellent pattern shape and cross-sectional shape, and a method for manufacturing it. <P>SOLUTION: The method for manufacturing a gray tone mask having a pattern consisting of a light shielding part, a translucent part, and a semi-translucent part comprises: a process for forming a first resist pattern 23a on a light shielding film 22 formed on a transparent substrate 21; a process for forming a light shielding film pattern 22a by etching the light shielding film using the resist pattern as a mask; a process for forming a semi-translucent film 24 on the light shielding film pattern 22a, and forming a second resist pattern 23b on it, and a process for forming a semi-translucent film pattern 24a by etching the semi-translucent film using the resist pattern as a mask. The material of the semi-translucent film has an etching rate higher than the material of the light shielding film, to an etchant for etching the semi-translucent film. For example, the light shielding film is of the material of which principal component is Cr, and the semi-translucent film is of the material which contains Cr and N. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
