POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a positive resist composition and a resist pattern forming method having fewer defects and superior in lithographic characteristics.

SOLUTION: The positive resist composition includes a resin component (A) having on a main chain a constituent unit derived from an (α-lower alkyl) acrylic acid ester having increased alkali solubility by the action of an acid and acid generating component (B) generating the acid by the irradiation with radiation. The resin component (A) is a copolymer having at least two constituent units obtained by the presence of the acid when manufactured by polymerizing at least one kind of monomer.

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