| 摘要 |
<P>PROBLEM TO BE SOLVED: To suppress a variation of pattern size small when changing an exposure amount. <P>SOLUTION: A resin component (A) contains a macromolecule compound (A1) containing a constituent unit (a1) having an acetal protection group, a constituent unit (a2) derived from acrylic ester including a lactone-containing ring group, and a constituent unit (a3) derived from acrylic ester containing a polar-group-containing aliphatic hydrocarbon group. An acid forming agent component (B) is a positive resist composition containing an onium salt-based acid forming agent (B1) having a cation part expressed by general formula (b-1) and a resist pattern forming method using it is provided. [In the formula, R<SP>11</SP>independently denotes an alkyl group, an alkoxy group, a halogen atom or a hydroxyl group, R<SP>12</SP>-R<SP>13</SP>may independently denote, an aryl group or an alkyl group which may include a substituent group, and n' denotes an integer of 0 or 1 to 3]. <P>COPYRIGHT: (C)2007,JPO&INPIT |
