发明名称 |
Deposition Apparatus and Deposition Method |
摘要 |
A deposition apparatus is provided for manufacturing an organic compound layer having a plurality of function regions. The deposition apparatus includes a plurality of evaporation sources within a deposition chamber, for enabling continuous formation of respective function regions comprised of organic compounds and, further, formation of a mixed region at an interface between adjacent ones of the function regions. With the deposition apparatus having such fabrication chamber, it is possible to prevent impurity contamination between the functions regions and further possible to form an organic compound layer with an energy gap relaxed at the interface.
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申请公布号 |
US2009058285(A1) |
申请公布日期 |
2009.03.05 |
申请号 |
US20080265212 |
申请日期 |
2008.11.05 |
申请人 |
SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
发明人 |
YAMAZAKI SHUNPEI;SEO SATOSHI;MIZUKAMI MAYUMI |
分类号 |
H01J1/62;H05B33/10;B05D7/24;C23C14/12;C23C14/56;H01L51/00;H01L51/40;H01L51/50;H05B33/02;H05B33/12 |
主分类号 |
H01J1/62 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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