| 摘要 |
PROBLEM TO BE SOLVED: To provide a gas barrier film having superior preservation stability.SOLUTION: A gas barrier film 11 comprises: a substrate 12; a first gas barrier layer 13 which is formed by applying a coating liquid containing a polysilazane compound on the substrate to form a coating film and irradiating the coating film with vacuum-ultraviolet rays; and a second gas barrier layer 14 which is formed by an atomic layer deposition method (ALD method) and contains a metal oxide, which are arranged in this order. |
