发明名称 洗浄装置
摘要 PROBLEM TO BE SOLVED: To prevent a wafer from falling from a spinner table which rotates at a high speed together with a frame.SOLUTION: Frame holding means 30 included in a washing device 2A cleaning a wafer W includes a frame support part 31 which supports a lower part 4b of a frame 4, and a plurality of frame press parts 32 which press an upper part 4a of the frame 4, and are arranged at equal angle intervals around the center of rotation of a spinner table 20. Each of the frame press parts 32 includes an arm part 300, a claw part 310 formed at an upper part 301 and pressing the frame 4, a weight part 320 formed at a low part 302, and a fulcrum shaft 330 supporting the arm part 300 rotatably so that the claw part 310 presses the upper part 4a of the frame 4. The weight part 320 has a blade 321 formed so as to generate lift force during rotation of the spinner table 20 in addition to centrifugal force, and the frame press part 32 presses the frame 4 to prevent the wafer W from falling from the spinner table 20.
申请公布号 JP5943588(B2) 申请公布日期 2016.07.05
申请号 JP20110260076 申请日期 2011.11.29
申请人 株式会社ディスコ 发明人 中西 優爾
分类号 H01L21/304;H01L21/683 主分类号 H01L21/304
代理机构 代理人
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