发明名称 |
METHOD FOR CONTROLLING CROSS-SECTIONAL SHAPE OF PHOTOSENSITIVE RESIN PATTERN, ELECTROFORMING DIE USING THE SAME, MICROCHEMICAL CHIP, DNA CHIP, AND MEMS PRODUCT |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for obtaining a desired cross-sectional shape as a cross-sectional shape of a fine groove pattern composed of a photosensitive resin material. <P>SOLUTION: In a method for forming a photosensitive resin pattern by using positive or negative photosensitive resins which are decomposed or hardened with light irradiation, and for forming the groove pattern composed of these photosensitive resins on a substrate with exposure and development, wherein the pattern is to be used for a flow channel of a microchemical chip, a chip for DNA analysis, a resist for chemical etching, and a resist for dry etching and so on, the cross-sectional shape of the photosensitive resin groove pattern is controlled to have a desired value by using proximity exposure as an exposing method, and exposure-developing by selecting a distance 7 between a photomask 3 and the substrate 9 with the photosensitive resin 8 applied thereto or by changing the distance 7 between the substrate and the photomask over time. <P>COPYRIGHT: (C)2007,JPO&INPIT |
申请公布号 |
JP2006330080(A) |
申请公布日期 |
2006.12.07 |
申请号 |
JP20050149660 |
申请日期 |
2005.05.23 |
申请人 |
YAMAMOTO HITOSHI;KISO YUJI;ONDA MAMORU |
发明人 |
SHIBATA TAKAYUKI;KUBOTA TOSHIO;YAMAMOTO HITOSHI;KISO YUJI;ONDA MAMORU |
分类号 |
G03F7/20;B81B1/00;B81C1/00;C25D1/10;G01N33/53;G01N37/00 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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