发明名称 |
Encapsulant with base for use in semiconductor encapsulation, semiconductor apparatus, and method for manufacturing semiconductor apparatus |
摘要 |
The present invention provides an encapsulant with a base for use in semiconductor encapsulation, for collectively encapsulating a device mounting surface of a substrate on which semiconductor devices are mounted, or a device forming surface of a wafer on which semiconductor devices are formed, the encapsulant comprising the base, an encapsulating resin layer composed of an uncured or semi-cured thermosetting resin formed on one surface of the base, and a surface resin layer formed on the other surface of the base. The encapsulant enables a semiconductor apparatus having a good appearance and laser marking property to be manufactured. |
申请公布号 |
US9449856(B2) |
申请公布日期 |
2016.09.20 |
申请号 |
US201414334060 |
申请日期 |
2014.07.17 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
Nakamura Tomoaki;Shiobara Toshio;Akiba Hideki;Sekiguchi Susumu |
分类号 |
H01L23/28;H01L21/56;H01L23/00;H01L23/31 |
主分类号 |
H01L23/28 |
代理机构 |
Oliff PLC |
代理人 |
Oliff PLC |
主权项 |
1. An encapsulant with a base for use in semiconductor encapsulation, for collectively encapsulating a device mounting surface of a substrate on which semiconductor devices are mounted, or a device forming surface of a wafer on which semiconductor devices are formed, comprising
the base being a support substrate composed of an organic resin substrate or a silicon wafer, an encapsulating resin layer composed of an uncured or semi-cured thermosetting resin formed on one surface of the base, and a surface resin layer formed on the other surface of the base. |
地址 |
Tokyo JP |