发明名称 Encapsulant with base for use in semiconductor encapsulation, semiconductor apparatus, and method for manufacturing semiconductor apparatus
摘要 The present invention provides an encapsulant with a base for use in semiconductor encapsulation, for collectively encapsulating a device mounting surface of a substrate on which semiconductor devices are mounted, or a device forming surface of a wafer on which semiconductor devices are formed, the encapsulant comprising the base, an encapsulating resin layer composed of an uncured or semi-cured thermosetting resin formed on one surface of the base, and a surface resin layer formed on the other surface of the base. The encapsulant enables a semiconductor apparatus having a good appearance and laser marking property to be manufactured.
申请公布号 US9449856(B2) 申请公布日期 2016.09.20
申请号 US201414334060 申请日期 2014.07.17
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 Nakamura Tomoaki;Shiobara Toshio;Akiba Hideki;Sekiguchi Susumu
分类号 H01L23/28;H01L21/56;H01L23/00;H01L23/31 主分类号 H01L23/28
代理机构 Oliff PLC 代理人 Oliff PLC
主权项 1. An encapsulant with a base for use in semiconductor encapsulation, for collectively encapsulating a device mounting surface of a substrate on which semiconductor devices are mounted, or a device forming surface of a wafer on which semiconductor devices are formed, comprising the base being a support substrate composed of an organic resin substrate or a silicon wafer, an encapsulating resin layer composed of an uncured or semi-cured thermosetting resin formed on one surface of the base, and a surface resin layer formed on the other surface of the base.
地址 Tokyo JP