Ceramic showerhead with embedded RF electrode for capacitively coupled plasma reactor

摘要

A showerhead assembly for a substrate processing system includes a back plate connected to a gas channel. A face plate is connected adjacent to a first surface of the back plate and includes a gas diffusion surface. An electrode is arranged in one of the back plate and the face plate and is connected to one or more conductors. A gas plenum is defined between the back plate and the face plate and is in fluid communication with the gas channel. The back plate and the face plate are made of a non-metallic material.

主权项

1. A showerhead assembly for a substrate processing system, comprising:
back plate connected to a gas channel; a face plate connected adjacent to a first surface of the back plate and including a gas diffusion surface; one or more conductors; and an electrode embedded within the back plate and connected to the one or more conductors, wherein at least one of a bottom surface of the back plate and a top surface of the face plate includes a recess such that a gas plenum (i) is defined in the recess between the back plate and the face plate below the electrode and (ii) is in fluid communication with the gas channel, and wherein the back plate and the face plate are made of a non-metallic material.