| 摘要 |
Provided are an LTPS array substrate and a method for fabrication thereof. The method comprises: on a base (21) comprising a gate (22) formed thereon, forming a dielectric layer (25), a semiconductor layer (26), and a positive photoresist layer (27); exposing the side of the base (21) facing away from the gate (22) to form a polycrystalline silicon layer; forming a source and a drain on the polycrystalline silicon layer; forming a pixel electrode (30) on the dielectric layer (25) and part of the source; forming on the source and the drain a flat passivation layer (31) having a contact hole; forming a transparent electrode layer (32) on the flat passivation layer (31), such that the transparent electrode layer (32) may be electrically connected to the gate (22), source, and drain by means of the contact hole. The invention is capable of reducing the types and quantity of photoreticles used by the LTPS process, and simplifying the process and reducing production costs. |
