Inspection apparatus and inspection method

摘要

An inspection apparatus includes an optical image acquisition unit to acquire an optical image of a photomask on which a plurality of figure patterns are formed, a first measurement unit to measure a first positional deviation amount in the horizontal direction at each position on the photomask accompanying deflection of the surface of the photomask generated by supporting the photomask using a support method which is used for acquiring the optical image, a second measurement unit to measure a second positional deviation amount of each of the plurality of figure patterns, by using the optical image, and a difference map generation unit to generate a difference map in which a difference value obtained by subtracting the first positional deviation amount from the second positional deviation amount is used as a map value, with respect to a region on the surface of the photomask.

主权项

1. An inspection apparatus comprising:
optical image acquisition processing circuitry configured to acquire an optical image of a photomask on which a plurality of figure patterns are formed; first measurement processing circuitry configured to measure a first positional deviation amount in a horizontal direction at each position on the photomask accompanying deflection of a surface of the photomask generated by supporting the photomask using a support method which is used for acquiring the optical image, said first positional deviation amount in the horizontal direction occurring by deflection due to the weight of the photomask and being generated at each position of the surface of the photomask, not dependent on the plurality of figure patterns; second measurement processing circuitry configured to measure a second positional deviation amount of each of the plurality of figure patterns, by using the optical image; and difference map generation processing circuitry configured to generate a difference map in which a difference value obtained by subtracting the first positional deviation amount from the second positional deviation amount is used as a map value, with respect to a region on the surface of the photomask.