| 摘要 |
PROBLEM TO BE SOLVED: To provide the radiation sensitive material low in cost and high in sensitivity and superior in transparence and etching resistance and adhesion and the pattern forming method by using this material. SOLUTION: This radiation sensitive material comprises an acrylic resin having at least each one unsaturated group, such as (meth)acryloyl group and a functional group to be allowed to generate an alkali-soluble group in the molecule by an acid and a substance (B) to be allowed to produce an acid by irradiation with radiation, such as a triphenylsulfonium-hexafluoro-antimony. |
