| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photoacid generator which can be easily manufactured, has a relatively low manufacturing cost, is excellent in stability for light and can be easily stored and treated, and to provide a chemically amplified resist composition containing the photoacid generator. <P>SOLUTION: The photoacid generator is represented by formula, and the chemically amplified resist composition uses the photoacid generator. R<SB>1</SB>, R<SB>2</SB>and R<SB>3</SB>is an alkyl group of C<SB>1</SB>to C<SB>10</SB>, wherein R<SB>2</SB>and R<SB>3</SB>may form a ring, in which at least one CH<SB>2</SB>can be substituted with S, O, N or ketone group and, moreover, one of alkyl group of C<SB>1</SB>to C<SB>10</SB>, cycloalkyl group, aliphatic hydrocarbon group, aromatic hydrocarbon group, hydroxyl group, cyano group, nitro group and halogen family element may be included. <P>COPYRIGHT: (C)2009,JPO&INPIT |
