发明名称 Method of measuring the overlay error, an inspection apparatus and a lithographic apparatus
摘要 The reflected radiation from a target mark including, for example, a plurality of gratings is detected by an array of pixels. The overlay error of the gratings for each pixel is detected, and an array of overlay errors is determined. Rather than simply averaging the overlay error value for all the pixels, filtering is performed. Pixels may be filtered according to the detected value of the overlay error or the detected intensity of the pixel.
申请公布号 US2009073448(A1) 申请公布日期 2009.03.19
申请号 US20070902061 申请日期 2007.09.18
申请人 ASML NETHERLANDS B.V. 发明人 TENNER MANFRED GAWEIN;SCHAAR MAURITS VAN DER
分类号 G01N21/47 主分类号 G01N21/47
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