| 摘要 |
PROBLEM TO BE SOLVED: To provide a composition for removing a photoresist residue and/or a polymer residue produced in a process for manufacturing a semiconductor circuit element; and a removing method with such a composition.SOLUTION: A composition for removing a photoresist residue and/or a polymer residue comprises saccharin and water. The composition is pH9.7 or below.SELECTED DRAWING: None |
