发明名称 Alignment of single-mode polymer waveguide (PWG) array and silicon waveguide (SIWG) array of providing adiabatic coupling
摘要 A method for fabricating, and a structure embodying, a single-mode polymer wave guide array aligned with a polymer waveguide array through adiabatic coupling. The present invention provides a structure having a combination of (i) a stub fabricated on a polymer and (ii) a groove fabricated on a silicon (Si) chip, with which an adiabatic coupling can be realized by aligning (a) a (single-mode) polymer waveguide (PWG) array fabricated on the polymer with (b) a silicon waveguide (SiWG) array fabricated on the silicon chip; wherein, the stub fabricated on the polymer is patterned according to a nano-imprint process, along with the PWG array, in a direction in which the PWG array is fabricated, and the groove fabricated on the silicon chip is fabricated along a direction in which the SiWG array is fabricated.
申请公布号 US9372305(B2) 申请公布日期 2016.06.21
申请号 US201314050450 申请日期 2013.10.10
申请人 International Business Machines Corporation 发明人 Numata Hidetoshi;Taira Yoichi;Tokunari Masao
分类号 B29D11/00;G02B6/10;G02B6/122;B29C33/38;G02B6/38;G02B6/42;G02B6/12;G02B6/28 主分类号 B29D11/00
代理机构 Scully, Scott, Murphy & Presser, P.C. 代理人 Scully, Scott, Murphy & Presser, P.C. ;Quinn, Esq. David
主权项 1. A method of fabricating on a polymer a (single-mode) polymer waveguide (PWG) array and a stub so that the (single-mode) polymer waveguide (PWG) array and the stub are aligned with a silicon waveguide (SiWG) array fabricated on a silicon (Si) chip and a groove fabricated along a direction in which the SiWG is fabricated, whereby an adiabatic coupling is realized, the method comprising the steps of: preparing a polymer base layer; placing on the polymer base layer a cast having a groove corresponding to a core of the (single-mode) polymer waveguide (PWG) array and a groove corresponding to the stub; hardening the polymer base layer; and removing the cast from the hardened polymer base layer.
地址 Armonk NY US
您可能感兴趣的专利