发明名称 |
SEMICONDUCTOR LASER |
摘要 |
A semiconductor laser includes: a stacked body having an active layer including a quantum well layer, the active layer having a cascade structure including a first region capable of emitting infrared laser light with a wavelength of not less than 12 μm and not more than 18 μm by an intersubband optical transition of the quantum well layer and a second region capable of relaxing energy of a carrier alternately stacked, the stacked body having a ridge waveguide and being capable of emitting the infrared laser light; and a dielectric layer provided so as to sandwich both sides of at least part of side surfaces of the stacked body, a wavelength at which a transmittance of the dielectric layer decreases to 50% being 16 μm or more, the dielectric layer having a refractive index lower than refractive indices of all layers constituting the active layer. |
申请公布号 |
US2016294161(A1) |
申请公布日期 |
2016.10.06 |
申请号 |
US201615182252 |
申请日期 |
2016.06.14 |
申请人 |
Kabushiki Kaisha Toshiba |
发明人 |
TAKAGI Shigeyuki;Yabuhara Hidehiko;Maekawa Akira;Fuji Takayoshi;Shiomi Yasumoto |
分类号 |
H01S5/34;H01S1/00;H01S5/12;H01S5/20;H01S5/343;H01S5/22 |
主分类号 |
H01S5/34 |
代理机构 |
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代理人 |
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主权项 |
1. A semiconductor laser comprising:
a stacked body disposed on an InP or GaAs substrate having an active layer including a quantum well layer the active aver having a cascade structure including a first region capable of emitting infrared laser light by an intersubband optical transition of the quantum well layer and a second region capable of relaxing energy of a carrier injected from the first region alternately stacked, the stacked body having a ridge waveguide and being capable of emitting the infrared laser light in a direction along which the ridge waveguide extends; and a dielectric layer provided so as to sandwich at least both sides of the active layer of the stacked body in a cross section, the dielectric layer having a refractive index lower than refractive indices of all lavers constituting the active layer, the dielectric layer being made of at least one single-crystal material of thallium bromoiodide, thallium bromochloride, ZnSe, CdTe, and diamond formed directly on the InP or GaAs substrate and including neither acceptors nor donors at a region adjacent to the side surfaces of the active layer. |
地址 |
Minato-ku JP |