发明名称 |
NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED RESIN FILM, PARTITION WALLS AND OPTICAL ELEMENT |
摘要 |
To provide a negative photosensitive resin composition for an optical element having good ink repellency and capable of reducing a residue at opening sections, a cured resin film for an optical element having good ink repellency, partition walls for an optical element capable of forming a high-precision pattern, and an optical element having such partition walls. A negative photosensitive resin composition comprising a photocurable alkali-soluble resin or alkali-soluble monomer (A), a photopolymerization initiator (B), a reactive ultraviolet absorber (C), a polymerization inhibitor (D), and an ink repellent (E); a cured film and partition walls formed by using the negative photosensitive resin composition; or an organic EL element, a quantum dot display, a TFT array, or a thin-film solar cell, having such partition walls positioned between a plurality of dots and their adjacent dots on a substrate surface. |
申请公布号 |
US2016334707(A1) |
申请公布日期 |
2016.11.17 |
申请号 |
US201615222031 |
申请日期 |
2016.07.28 |
申请人 |
Asahi Glass Company, Limited |
发明人 |
NAGAI Yusuke;TAKAHASHI Hideyuki;KAWASHIMA Masayuki |
分类号 |
G03F7/075;H01L51/42;H01L51/05;H01L51/00;H01L51/50 |
主分类号 |
G03F7/075 |
代理机构 |
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代理人 |
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主权项 |
1. A negative photosensitive resin composition for an organic EL element, a quantum dot display, a TFT array or a thin film solar cell, characterized by comprising an alkali-soluble resin or alkali-soluble monomer (A) having a photo-curable property, a photopolymerization initiator (B), a reactive ultraviolet absorber (C), a polymerization inhibitor (D) and an ink repellent (E). |
地址 |
Chiyoda-ku JP |