发明名称 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED RESIN FILM, PARTITION WALLS AND OPTICAL ELEMENT
摘要 To provide a negative photosensitive resin composition for an optical element having good ink repellency and capable of reducing a residue at opening sections, a cured resin film for an optical element having good ink repellency, partition walls for an optical element capable of forming a high-precision pattern, and an optical element having such partition walls. A negative photosensitive resin composition comprising a photocurable alkali-soluble resin or alkali-soluble monomer (A), a photopolymerization initiator (B), a reactive ultraviolet absorber (C), a polymerization inhibitor (D), and an ink repellent (E); a cured film and partition walls formed by using the negative photosensitive resin composition; or an organic EL element, a quantum dot display, a TFT array, or a thin-film solar cell, having such partition walls positioned between a plurality of dots and their adjacent dots on a substrate surface.
申请公布号 US2016334707(A1) 申请公布日期 2016.11.17
申请号 US201615222031 申请日期 2016.07.28
申请人 Asahi Glass Company, Limited 发明人 NAGAI Yusuke;TAKAHASHI Hideyuki;KAWASHIMA Masayuki
分类号 G03F7/075;H01L51/42;H01L51/05;H01L51/00;H01L51/50 主分类号 G03F7/075
代理机构 代理人
主权项 1. A negative photosensitive resin composition for an organic EL element, a quantum dot display, a TFT array or a thin film solar cell, characterized by comprising an alkali-soluble resin or alkali-soluble monomer (A) having a photo-curable property, a photopolymerization initiator (B), a reactive ultraviolet absorber (C), a polymerization inhibitor (D) and an ink repellent (E).
地址 Chiyoda-ku JP