发明名称 Device substrate, production method therefor, electronic device, production method therefor, optic device, production method therefor, and electronic apparatus
摘要 To provide a device substrate and a production method therefor, which device substrate has a film having a reflection function and can be formed by a production process that does not require a vacuum process inviting increased production cost. A device substrate includes a substrate, an electronic element mounted above the substrate, and a film having a phase separation structure and arranged above the electronic element so as to cover at least a part of the substrate or the electronic element. Alternatively, the film having a phase separation structure in the above configuration may be arranged below the electronic element. The film having a phase separation structure can be arranged so as not come in contact with the substrate.
申请公布号 US7166872(B2) 申请公布日期 2007.01.23
申请号 US20030639534 申请日期 2003.08.13
申请人 SEIKO EPSON CORPORATION 发明人 MIYAZAWA TAKASHI
分类号 H01L27/15;C09K19/52;G02F1/1335;G09F9/30;H01L21/00;H01L51/50;H01S3/02;H05B33/14;H05B33/22;H05K1/03;H05K1/16 主分类号 H01L27/15
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