发明名称 |
Device substrate, production method therefor, electronic device, production method therefor, optic device, production method therefor, and electronic apparatus |
摘要 |
To provide a device substrate and a production method therefor, which device substrate has a film having a reflection function and can be formed by a production process that does not require a vacuum process inviting increased production cost. A device substrate includes a substrate, an electronic element mounted above the substrate, and a film having a phase separation structure and arranged above the electronic element so as to cover at least a part of the substrate or the electronic element. Alternatively, the film having a phase separation structure in the above configuration may be arranged below the electronic element. The film having a phase separation structure can be arranged so as not come in contact with the substrate.
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申请公布号 |
US7166872(B2) |
申请公布日期 |
2007.01.23 |
申请号 |
US20030639534 |
申请日期 |
2003.08.13 |
申请人 |
SEIKO EPSON CORPORATION |
发明人 |
MIYAZAWA TAKASHI |
分类号 |
H01L27/15;C09K19/52;G02F1/1335;G09F9/30;H01L21/00;H01L51/50;H01S3/02;H05B33/14;H05B33/22;H05K1/03;H05K1/16 |
主分类号 |
H01L27/15 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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