发明名称 |
PRODUCTION OF HIGH-PURITY ACID AND HIGH-PURITY WATER |
摘要 |
PURPOSE:To provide a method for easily producing (purifying) pure water and inorganic acid of high-purity which are suitable for the manufacturing process of a semiconductor device by selecting and removing an impure metallic element contained in pure water and inorganic acid efficiently and surely. CONSTITUTION:A method for producing high-purity acid and high-purity water is equipped with a process for applying treatment of at least either of magnetic attraction and potential difference attraction to a kind of liquid 2 to be treated which is selected from the group of inorganic acid and pure water and for selectively removing an impure metallic component contained therein and a process for vaporizing the liquid 2' to be treated in which the impure metallic component has been removed and liquefying the steam. |
申请公布号 |
JPH0760292(A) |
申请公布日期 |
1995.03.07 |
申请号 |
JP19930215374 |
申请日期 |
1993.08.31 |
申请人 |
TOSHIBA CORP |
发明人 |
TAKENAKA MIYUKI;YOSHIDA TAKASHI;YOKOTE YUKARI;KOZUKA SHOJI;MATSUNAGA HIDEKI |
分类号 |
C02F1/04;C02F1/48;C02F1/62;C02F9/00 |
主分类号 |
C02F1/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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