| 摘要 |
In a multilayer mirror ( 1 ) for the reflection of EUV radiation containing a large number of alternating molybdenum layers ( 4 ) and silicon layers ( 3 ), a barrier layer ( 5 ) containing a silicon nitride or a silicon boride is included at a number of interfaces between the molybdenum layers ( 4 ) and the silicon layers ( 3 ). As a result of the barrier layers ( 5 ) of a silicon nitride or of a silicon boride, high thermal stability is achieved, in particular high long-term stability at temperatures of more than 300° C., whilst at the same time achieving high reflectivity in the multilayer mirror. A multilayer mirror ( 1 ) of this type can, in particular, be used as a heatable collector mirror for an EUV radiation source.
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