发明名称 Process for forming a stack of different materials, and device comprising this stack
摘要 A stack of layers defines a filter and is formed by copper on hydrogenated silicon nitride supported by a carrier. The filter includes a layer of hydrogenated silicon nitride, a layer of silicon oxide on the layer of hydrogenated silicon nitride and a layer of copper on the layer of silicon oxide. The layer of hydrogenated silicon nitride may have, in a vicinity of its upper side, a ratio of a number of silicon atoms per cubic centimeter to a number of nitrogen atoms per cubic centimeter lower than 0.8 (or even lower than 0.6), with a number of silicon-hydrogen bonds smaller than or equal to 6×1021 bonds per cubic centimeter (or even smaller than 0.5×1021 bonds per cubic centimeter). The filter further includes an additional layer of copper between the layer of hydrogenated silicon nitride and the carrier.
申请公布号 US9397128(B2) 申请公布日期 2016.07.19
申请号 US201414503460 申请日期 2014.10.01
申请人 STMicroelectronics SA 发明人 Gros D'aillon Patrick;Marty Michel
分类号 H01L27/146;G02B5/20;G02B5/28;H04N9/04 主分类号 H01L27/146
代理机构 Gardere Wynne Sewell LLP 代理人 Gardere Wynne Sewell LLP
主权项 1. A process, comprising: forming a layer of hydrogenated silicon nitride directly on a lower layer of copper that is supported by a carrier, wherein the layer of hydrogenated silicon nitride has, in a vicinity of an upper side, a ratio of a number of silicon atoms per cubic centimeter to a number of nitrogen atoms per cubic centimeter that is lower than 0.8; forming a layer of silicon oxide directly on the layer of hydrogenated silicon nitride; and forming an upper layer of copper directly on the layer of silicon oxide.
地址 Montrouge FR