Electrostatic chuck and semiconductor manufacturing device

摘要

An electrostatic chuck includes a placing stage formed from a ceramic including aluminum oxide and yttrium oxide, and an electrostatic electrode arranged in the placing stage, wherein a content rate of the yttrium oxide is 0.5 wt % to 2.0 wt %. Preferably, the electrostatic chuck is used while being heated at a temperature of 100° C. to 200° C.

主权项

1. An electrostatic chuck, comprising:
a placing stage formed from a ceramic including aluminum oxide and yttrium oxide; and an electrostatic electrode arranged in the placing stage, wherein a content rate of the aluminum oxide is 94.2 wt % to 96.1 wt %, and a content rate of the yttrium oxide is 0.5 wt % to 2.0 wt %.