Apparatuses and methods for treating substrate

摘要

Provided is a substrate treating apparatus, which includes a process chamber providing a space in which a substrate is treated, an exhausting pipe connected to the process chamber, and providing a passage through which gas is discharged from the process chamber to an outside thereof, a pump installed on the exhausting pipe, and a valve installed on the exhausting pipe between the process chamber and the pump, and opening and closing the passage. The valve includes a first plate provided with exhausting holes, and a first driver moving the first plate such that the exhausting holes are located within the passage or outside the passage.

主权项

1. A substrate treating apparatus comprising:
a process chamber providing a space in which a substrate is treated; an exhausting pipe connected to the process chamber, and providing a passage through which gas is discharged from the process chamber to an outside thereof, wherein the exhausting pipe and the passage are each disposed below a bottom surface of the process chamber; a pump installed on the exhausting pipe; and a valve installed on the exhausting pipe between the process chamber and the pump, wherein the valve is configured to open and close the passage for changing an internal pressure within the process chamber, and wherein the valve comprises:
a first slot-free plate comprising a planar surface area that is symmetrically shaped and extending along a first plane, wherein a second plane that is orthogonal with respect to the first plane bisects the planar surface area into equally sized first and second portions, wherein a plurality of exhausting holes is disposed in the first plate, each of the plurality of exhausting holes comprising a substantially equal diameter, the plurality of exhausting holes being off center with respect to the planar surface area of the first plate and disposed in the first portion of the first plate, wherein the second portion of the first plate is devoid exhausting holes;a first driver configured to move the first plate such that at least some exhausting holes of the plurality of exhausting holes are located either within the passage or outside the passage;wherein, when the slot-free plate is in a closed position, sealing members comprising at least one sealing ring, a plurality of driving rods, and a plurality of springs bias the slot-free plate in the closed position to prevent leakage of exhaust gas.