发明名称 METHOD OF BEVEL PROCESSING OF PCB SUBSTRATE
摘要 According to an embodiment of the present invention, in a method to treat a bevel, provided is a unit substrate having a certain width, length, and thickness. The end part of the unit substrate includes first to third areas having an outline formed in a longitudinal direction. The edge part of the end part is cut and treated by moving in the longitudinal direction. At this time, one or more among the first to third areas have an outline which is not parallel to the other areas. The treating step performs cutting in a straight direction along the outline and in a diagonal direction with regard to the straight direction, and performs cutting continuously on the treatment route from the first area to the third area through the second area. The present invention aims to provide a method to more easily treat the bevel in accordance with the shape of an outline of a PCB. The method of the present invention comprises: a step of providing the unit substrate having the certain width, length, and thickness; and a step of cutting the edge part of the end part of the unit substrate.
申请公布号 KR20160104846(A) 申请公布日期 2016.09.06
申请号 KR20150027632 申请日期 2015.02.26
申请人 I NANOTECH CO., LTD.;SIMMTECH CO., LTD. 发明人 PARK, TALLI;PARK, JUNG KUN;PARK, HYUN CHANG;AHN, YOUNG JUN;PARK, CHAN SOL;PARK, HYUN OH;LEE, SEONG KIL
分类号 H05K3/00;H05K1/11 主分类号 H05K3/00
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