发明名称 Optically-Finished Thin Diamond Substrate or Window of High Aspect Ratio and a Method of Production Thereof
摘要 In a method of forming a diamond film, substrate, or window, a silicon substrate is provided and the diamond film, substrate, or window is CVD grown on a surface of the silicon substrate. The grown diamond film, substrate, or window has an aspect ratio ≧100, wherein the aspect ratio is a ratio of a largest dimension of the diamond film, substrate or window divided by a thickness of the diamond film. The silicon substrate can optionally be removed or separated from the grown diamond film, substrate, or window.
申请公布号 US2016333472(A1) 申请公布日期 2016.11.17
申请号 US201615093160 申请日期 2016.04.07
申请人 II-VI Incorporated 发明人 Xu Wen-Qing;Anderson Thomas E.;Barbarossa Giovanni;Eissler Elgin E.;Liu Chao;Tanner Charles D.
分类号 C23C16/27;C23C16/511 主分类号 C23C16/27
代理机构 代理人
主权项 1. A diamond film, substrate or window comprising: at least one optically-finished surface; and an aspect ratio of a largest dimension of the diamond film, substrate or window divided by a thickness of the diamond film, substrate or window of ≧100.
地址 Saxonburg PA US